Plasma surface activation technique has become very popular nowadays. It is the process in which functional groups are available or present in polymer surface gets replaced with various atoms from the ions present in plasma. This helps the surface to increase its energy. In simple term you can say that plasma activation is often useful for the preparation of the surface that is needed to be bonded or printed.
More about the plasma activation
In this process surface gets exposed with energetic species that further breaks the polymer at the surface only and it also creates the free radicals. Plasma has UV radiation at very high level that helps to create additional free radical on Teflon surface or on the plastic. Free radicals react very quickly with material itself because they are known as very unstable. Due to this it allows surface to form the covalent bond that is stable.
Benefits of the plasma surface activation technique
Best polymer materials use in this technique
Photoresist materials are basically polymer materials. Properties of photo resist materials get changed when it gets exposed to light. In positive photo resist case when it gets exposed to light chain of the polymer breaks and it get soft and during the development process it is removed. While on the other hand, in the negative photo resist case region exposed gets hard. This type of material is widely used in photonic and semiconductor industries. What make these materials special is its resolution and sensitivity. That's why it is widely use for the binary fabrication and diffractive optical analog elements, structure, lenses, waveguide and many more. These materials are used in industry as well as in research level.
